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• W3079463359 abstract "We have studied thin film growth of NiAl on Nickel (001) substrate using molecular dynamics simulations (MD) based on the Embedded Atom Method (EAM) potential. An incidence energy of 0.06 eV at 800 K, 900 K and 1000 K was considered. After the deposition process, we have obtained a B2-NiAl structure film with different percentages; 32.6% for the temperature 1000 K, 30% for 900 K and 25% for 800 K. Our investigation has prompt us to analyze the crystalline structure. During the evolution of deposited film, we observe the formation of grains with different orientation, as well as the appearance of vacancies in Ni and Al sublattices and antisites." @default.
• W3079463359 created "2020-08-24" @default.
• W3079463359 creator A5006563955 @default.
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• W3079463359 date "2020-09-01" @default.
• W3079463359 modified "2023-09-24" @default.
• W3079463359 title "NiAl thin film growth on Ni(001) substrate using molecular dynamics simulations" @default.
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• W3079463359 doi "https://doi.org/10.1051/epjap/2020200186" @default.
• W3079463359 hasPublicationYear "2020" @default.
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