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- W3081750450 endingPage "138319" @default.
- W3081750450 startingPage "138319" @default.
- W3081750450 abstract "Amorphous carbon-based coatings deposited on copper substrates by magnetron sputtering at different target-to-substrate distances were investigated. Films deposited at short distances as 2 cm presented the best results in terms of morphology, density, and resistivity. Ultraviolet near-infrared range spectrometry measurements determined total reflectance and ellipsometry, extinction coefficient, refraction index, and pseudo bandgap. Amorphous carbon films of 150 nm deposited at 2 cm reduced the total reflectance by up to 60 ± 5% in the near-infra-red range when compared to pure copper films. The addition of Fe* boosts the absorption of the coating reducing the total reflectance by up to 70 ± 5% in near-infrared. (Fe*: deposited from stainless-steel target used in direct-current magnetron sputtering). Also, Fe* reduces the electrical resistivity by a factor of 100 compared to that of pure amorphous carbon films. The reduction in total reflectance induced by the presence of the amorphous carbon-based films on copper depends, as expected, on light penetration depth and the absorption coefficient." @default.
- W3081750450 created "2020-09-08" @default.
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- W3081750450 date "2020-10-01" @default.
- W3081750450 modified "2023-10-18" @default.
- W3081750450 title "Low resistivity amorphous carbon-based thin films employed as anti-reflective coatings on copper" @default.
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- W3081750450 doi "https://doi.org/10.1016/j.tsf.2020.138319" @default.
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