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• W3085671570 abstract "A potential oscillation was observed during galvanostatic deposition of Co in the presence of 3-mercapto-1-propanesulfonate (MPS) and a systematic study was conducted. A suppression effect on Co deposition by MPS was seen in cyclic voltammetry (CV) and such effect was not affected by pH. To fully understand the suppression effect and oscillation mechanism, several influencing factors in the galvanostatic process such as pH, Co2+ and MPS concentrations, agitation, and a buffer agent were thoroughly investigated. Moreover, mercaptopropionic acid, an alternative additive with a similar molecular structure as MPS, was used to determine the roles of thiol and sulfonate groups during the oscillation. Based on the experiment results, a kinetically controlled mechanism including a potential-dependent adsorption–desorption of the Co–MPS complex accompanied by the accumulation and dissolution of Co(OH)2 was proposed." @default.
• W3085671570 created "2020-09-21" @default.
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• W3085671570 date "2020-09-10" @default.
• W3085671570 modified "2023-10-11" @default.
• W3085671570 title "Oscillatory Behavior in Cobalt Electrodeposition with 3-Mercapto-1-Propanesulfonate" @default.
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• W3085671570 doi "https://doi.org/10.1021/acs.jpcc.0c06877" @default.
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