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• W3089117586 endingPage "124" @default.
• W3089117586 startingPage "113" @default.
• W3089117586 abstract "In this paper, we present a multiscale model with application to the plasma etch process on a three dimensions substrate lattice with uniform thickness using the inductive coupled plasma (ICP). Specifically, we focus on a etch process on silicon with patterned resistive mask. And a multiscale model is developed to simulate both the gas-phase reactions and transportation phenomena in Cl2/Ar plasma chamber as well as the complex interactions that occurs on the silicon substrate. A macroscopic continuous fluid model, which based on partial differential equations (PDEs), is applied to simulate the plasma reactions as well as the transportation phenomena. The fluid model is constructed in COMSOL MultiphysicsTM. Subsequently, the microscopic interactions that taken place on the substrate are simulated by a kinetic Monte Carlo (kMC) model. A spatial-temporal discrete method is applied to address the issue in computing the fluid model and the kMC model concurrently, in which kMC models are parrallelly computed in discrete locations and data exchange between the fluid model as well as the kMC models are implemented in discrete time. Additionally, neural network (NN) is implemented to approximate the kMC model in order to reduce the computational complexity for model-based feedback control. The NN model is then used in a predictive real-time optimizer that optimize the setpoints of a set of critical proportion integral (PI) loops to achieve desired control objectives. Simulation results shows that the model is accurate and the controllers are effective." @default.
• W3089117586 created "2020-10-01" @default.
• W3089117586 creator A5029175968 @default.
• W3089117586 creator A5087125324 @default.
• W3089117586 date "2020-12-01" @default.
• W3089117586 modified "2023-09-26" @default.
• W3089117586 title "Multiscale modeling and neural network model based control of a plasma etch process" @default.
• W3089117586 cites W1197831148 @default.
• W3089117586 cites W1785545812 @default.
• W3089117586 cites W1965476147 @default.
• W3089117586 cites W1969852806 @default.
• W3089117586 cites W1971828193 @default.
• W3089117586 cites W1973641880 @default.
• W3089117586 cites W1975327134 @default.
• W3089117586 cites W1994069792 @default.
• W3089117586 cites W1997913942 @default.
• W3089117586 cites W2000924496 @default.
• W3089117586 cites W2006118587 @default.
• W3089117586 cites W2009015150 @default.
• W3089117586 cites W2020311535 @default.
• W3089117586 cites W2027434887 @default.
• W3089117586 cites W2048287682 @default.
• W3089117586 cites W2057896693 @default.
• W3089117586 cites W2059535680 @default.
• W3089117586 cites W2060650165 @default.
• W3089117586 cites W2061263534 @default.
• W3089117586 cites W2063326440 @default.
• W3089117586 cites W2083877606 @default.
• W3089117586 cites W2102387029 @default.
• W3089117586 cites W2118780642 @default.
• W3089117586 cites W2124153771 @default.
• W3089117586 cites W2127292566 @default.
• W3089117586 cites W2138484437 @default.
• W3089117586 cites W2145297852 @default.
• W3089117586 cites W2153357396 @default.
• W3089117586 cites W2155521997 @default.
• W3089117586 cites W2172282498 @default.
• W3089117586 cites W2463622642 @default.
• W3089117586 cites W2618372328 @default.
• W3089117586 cites W2672174558 @default.
• W3089117586 cites W2763498028 @default.
• W3089117586 cites W2778417621 @default.
• W3089117586 cites W2890431580 @default.
• W3089117586 cites W2903693971 @default.
• W3089117586 cites W2924393512 @default.
• W3089117586 cites W2962759047 @default.
• W3089117586 cites W2972796812 @default.
• W3089117586 cites W2973313168 @default.
• W3089117586 cites W2998769609 @default.
• W3089117586 doi "https://doi.org/10.1016/j.cherd.2020.09.013" @default.
• W3089117586 hasPublicationYear "2020" @default.
• W3089117586 type Work @default.
• W3089117586 sameAs 3089117586 @default.
• W3089117586 citedByCount "6" @default.
• W3089117586 countsByYear W30891175862021 @default.
• W3089117586 countsByYear W30891175862022 @default.
• W3089117586 crossrefType "journal-article" @default.
• W3089117586 hasAuthorship W3089117586A5029175968 @default.
• W3089117586 hasAuthorship W3089117586A5087125324 @default.
• W3089117586 hasConcept C100460472 @default.
• W3089117586 hasConcept C105795698 @default.
• W3089117586 hasConcept C107187091 @default.
• W3089117586 hasConcept C111368507 @default.
• W3089117586 hasConcept C111919701 @default.
• W3089117586 hasConcept C121332964 @default.
• W3089117586 hasConcept C121864883 @default.
• W3089117586 hasConcept C127313418 @default.
• W3089117586 hasConcept C146651103 @default.
• W3089117586 hasConcept C154945302 @default.
• W3089117586 hasConcept C155386361 @default.
• W3089117586 hasConcept C171250308 @default.
• W3089117586 hasConcept C172205157 @default.
• W3089117586 hasConcept C192562407 @default.
• W3089117586 hasConcept C19499675 @default.
• W3089117586 hasConcept C2775924081 @default.
• W3089117586 hasConcept C2777289219 @default.
• W3089117586 hasConcept C2779227376 @default.
• W3089117586 hasConcept C31972630 @default.
• W3089117586 hasConcept C33923547 @default.
• W3089117586 hasConcept C41008148 @default.
• W3089117586 hasConcept C45786274 @default.
• W3089117586 hasConcept C47446073 @default.
• W3089117586 hasConcept C50644808 @default.
• W3089117586 hasConcept C62520636 @default.
• W3089117586 hasConcept C6899612 @default.
• W3089117586 hasConcept C82706917 @default.
• W3089117586 hasConcept C98045186 @default.
• W3089117586 hasConceptScore W3089117586C100460472 @default.
• W3089117586 hasConceptScore W3089117586C105795698 @default.
• W3089117586 hasConceptScore W3089117586C107187091 @default.
• W3089117586 hasConceptScore W3089117586C111368507 @default.
• W3089117586 hasConceptScore W3089117586C111919701 @default.
• W3089117586 hasConceptScore W3089117586C121332964 @default.
• W3089117586 hasConceptScore W3089117586C121864883 @default.
• W3089117586 hasConceptScore W3089117586C127313418 @default.
• W3089117586 hasConceptScore W3089117586C146651103 @default.
• W3089117586 hasConceptScore W3089117586C154945302 @default.
• W3089117586 hasConceptScore W3089117586C155386361 @default.

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