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- W3095062893 abstract "It is well established that ion implantation techniques can be used to introduce selected impurities into solids in a controlled, accurate and often unique manner. Recent experiments have shown that pulsed laser processing of materkals can lead to surface melting, dopant redistribution and crystal regrowth, all on extremely short time scales (≲1μ sec.). These two processes can be combined to achieve properties not possible with normal materials preparagion techniques, or to alter materials properties in a more efficient manner. Investigations will be presented utilizing the combined techniques of positive ion scattering‐channeling, x‐ray scattering and transmission electron microscopy which show that supersaturated alloys can be formed in the surface regions (∠1μm) of ion implanted, laser annealed silicon single crystals, and that these surfaces undergo a unique one dimensional lattice contraction or expansion depending on the dopant species. The resultant surface has a lattice parameter significantly dif..." @default.
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- W3095062893 date "1978-12-01" @default.
- W3095062893 modified "2023-09-27" @default.
- W3095062893 title "New materials properties achievable by ion implantation doping and laser processing" @default.
- W3095062893 hasPublicationYear "1978" @default.
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