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- W3095379693 abstract "A new full-dry processing method has been developed that includes a new sacrificial layer dry etching technique, which enables the microscopic structures used for microsensors to be released from silicon substrates with high repeatability, and a new water-repellent dry coating technique, which prevents the released structures from sticking to substrates during operation. The usefulness of this full-dry processing method from etching to coating, with respect to the length of releasable cantilevers, was evaluated by comparison with the conventional wet method. It was confirmed that the full-dry processing method permits sustainable cantilevers to be about three times longer than those released using the conventional wet method." @default.
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- W3095379693 date "2003-01-01" @default.
- W3095379693 modified "2023-10-17" @default.
- W3095379693 title "A Full-dry Processing Technique from Sacrificial Layer Etching to Water-repellent Coating" @default.
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- W3095379693 doi "https://doi.org/10.1541/ieejsmas.123.190" @default.
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