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• W3098960444 abstract "Atomically-abrupt interfaces in transition metal oxide (TMO) heterostructures could host a variety of exotic condensed matter phases that may not be found in the bulk materials at equilibrium. A critical step in the development of such atomically-sharp interfaces is the deposition of atomically-smooth TMO thin films. Optimized deposition conditions exist for the growth of perovskite oxides. However, the deposition of rutile oxides, such as VO$_2$, with atomic-layer precision has been challenging. In this work, we used pulsed laser deposition (PLD) to grow atomically-smooth VO$_2$ thin films on rutile TiO$_2$ (101) substrates. We show that optimal substrate preparation procedure followed by the deposition of VO$_2$ films at a temperature conducive for step-flow growth mode is essential for achieving atomically-smooth VO$_2$ films. The films deposited at optimal substrate temperatures show a step and terrace structure of the underlying TiO$_2$ substrate. At lower deposition temperatures, there is a transition to a mixed growth mode comprising of island growth and layer-by-layer growth modes. VO$_2$ films deposited at optimal substrate temperatures undergo a metal to insulator transition at a transition temperature of $sim$325 K with $sim$10$^3$ times increase in resistance, akin to MIT in bulk VO$_2$." @default.
• W3098960444 created "2020-11-23" @default.
• W3098960444 creator A5010859407 @default.
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• W3098960444 date "2019-12-03" @default.
• W3098960444 modified "2023-10-10" @default.
• W3098960444 title "Atomically-smooth single-crystalline VO2 (101) thin films with sharp metal-insulator transition" @default.
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• W3098960444 doi "https://doi.org/10.1063/1.5124106" @default.
• W3098960444 hasPublicationYear "2019" @default.
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