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- W3107513986 abstract "Flows of thin layers of viscous liquids (liquid films) are investigated due to wide usage of film apparatuses in many industries such as chemical, petrochemical, energy, etc. Study and calculation of liquid film wave characteristics make it possible to improve industry equipment because of better understanding how various physical and chemical factors influence on liquid film flow. For moderate Reynolds numbers, a mathematical model of the wavy flow of viscous liquid film is presented – system of Navier-Stokes and continuity equations with boundary conditions taking into account surface tension forces, surface viscosity, and thermocapillary forces. A nonlinear partial differential equation describing the state of the free surface of a liquid film is obtained. In the scope of the mathematical model, algorithms and programs are developed to calculate wave characteristics (frequency, increment, phase velocity) of liquid film." @default.
- W3107513986 created "2020-12-07" @default.
- W3107513986 creator A5032433664 @default.
- W3107513986 date "2020-01-01" @default.
- W3107513986 modified "2023-10-18" @default.
- W3107513986 title "Mathematical modeling of wave parameters of the flow of a thin layer of viscous liquid in film apparatuses" @default.
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- W3107513986 doi "https://doi.org/10.1063/5.0035536" @default.
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