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• W3115834350 abstract "Soft imprint lithography for liquid crystal (LC) alignment using a poly(dimethylsiloxane) (PDMS) wrinkled structure formed by UV–ozone (UVO) treatment was investigated in this study. Oxidation of the PDMS surface formed a silica-like outer layer that caused elastic moduli mismatch with the inner PDMS layer, leading to the formation of a wrinkled structure. This wrinkled PDMS was used as a stamp for LC alignment via soft imprint lithography. The wrinkled structure was transferred to the polyimide alignment layer and then LC cells were fabricated using the wrinkled substrates. The pretilt angle and electro-optical properties of the LC cells fabricated in this manner had performance similar to that of LC cells fabricated using the conventional rubbing method." @default.
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• W3115834350 date "2021-02-01" @default.
• W3115834350 modified "2023-10-18" @default.
• W3115834350 title "Soft imprint lithography for liquid crystal alignment using a wrinkled UVO-treated PDMS transferring method" @default.
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• W3115834350 doi "https://doi.org/10.1016/j.molliq.2020.115150" @default.
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