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- W3119542887 abstract "Abstract In this work, we investigate the effect of BOX (Buried OXide) and silicon thickness on the SCE (Short-Channel Effects) of ET-SOI (Extremely Thin Silicon-on-Insulator) MOSFETs. It is found that the minimum channel length Lmin is only moderately sensitive to the BOX thickness but strongly dependent on the silicon thickness. For a given threshold voltage, the choice of gate work function in combination with the backgate bias also plays a role on Lmin. Reverse bias mitigates SCE while forward bias aggravates SCE. An empirical expression of Lmin in terms of silicon thickness is given." @default.
- W3119542887 created "2021-01-18" @default.
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- W3119542887 date "2021-02-01" @default.
- W3119542887 modified "2023-09-27" @default.
- W3119542887 title "Effects of BOX thickness, silicon thickness, and backgate bias on SCE of ET-SOI MOSFETs" @default.
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- W3119542887 doi "https://doi.org/10.1016/j.mee.2021.111506" @default.
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