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• W3119871275 abstract "Abstract The oxide growth mechanism on Al (100), (110) and (111) and the corresponding oxide film properties were examined using all-atom molecular dynamics simulations. The growth kinetics of the aluminum oxide film at a constant dose rate of oxygen were analyzed. Al (110), with a structurally unstable surface and a high surface energy, showed the highest oxide growth rate, oxygen adsorption rate, and adsorption energy. However, as the crystallinity of the surface structure collapsed as oxidation progressed, the reaction energy of Al (110) with atomic oxygen converged to the same value as that of Al (100) and (111). Instead, a high anisotropic residual stress remained in the oxide layer on Al (110) with the aid of high surface energy and anisotropic surface structure. The results suggest that although the chemical bonding features of the as-prepared oxide layers were similar, the intermediate process of oxide film formation and the resultant mechanical properties were highly dependent on surface crystallinity. The oxidation kinetics model presented in this work showed consistency with other reported ab initio calculations. Moreover, it also successfully reproduced the experimental fact that the formation speed of oxygen islands on Al (100) is more delayed than that on Al (111)." @default.
• W3119871275 created "2021-01-18" @default.
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• W3119871275 date "2021-03-01" @default.
• W3119871275 modified "2023-10-13" @default.
• W3119871275 title "Oxide growth characteristics on Al (100), (110), and (111) surfaces: A chemo-mechanical evaluation" @default.
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• W3119871275 doi "https://doi.org/10.1016/j.mtcomm.2020.102006" @default.
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