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- W3125017981 endingPage "105660" @default.
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- W3125017981 abstract "The semi-polar (11–22) plane AlInGaN quaternary alloys were grown successfully on the m-plane (10-10) sapphire substrates with metalorganic chemical vapor deposition technology. Optical microscope, atomic force microscope, energy-dispersive X-ray spectroscopy, X-ray diffraction, and room temperature photoluminescence spectroscopy were used to study the effects of V/III ratio and trimethyl-indium flow rate on the characteristics of the grown semi-polar (11–22) plane AlInGaN quaternary alloys. It was found that the In composition of the semi-polar (11–22) plane AlInGaN quaternary alloys decreased as the V/III ratio increased. It was also revealed that the surface morphology, crystalline quality, and the optical property could be improved, and the phase separation in the quaternary alloy could be suppressed significantly by optimizing the V/III ratio and the trimethyl-indium flow rates." @default.
- W3125017981 created "2021-02-01" @default.
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- W3125017981 date "2021-05-01" @default.
- W3125017981 modified "2023-09-27" @default.
- W3125017981 title "Epitaxial growth of semi-polar (11–22) plane AlInGaN quaternary alloys on m-plane (10-10) sapphire substrates" @default.
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- W3125017981 doi "https://doi.org/10.1016/j.mssp.2021.105660" @default.
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