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- W3128780087 abstract "In the development of thin-film deposition process, vacuum- and solution-based ones are the two main techniques for growing nanocrystalline materials. Solution-based process for fabricating nanocrystalline semiconductors has attracted more attention due to its low processing temperature, inexpensive capital cost, and large-area deposition capability. Chemical solution deposition is mainly performed in a batch reactor by simultaneously feeding all reactants for reaction. The desired products are then removed after the reaction is completed. Consequently, it is difficult to achieve a high reaction selectivity to minimize unwanted by-products. In this chapter, we present microreactor-assisted chemical solution deposition processes that are capable of overcoming this limitation by producing short-life molecular intermediates which is used for growing heterogeneous nanocrystalline semiconductor thin films and point-of-use deposition before homogeneous reactions." @default.
- W3128780087 created "2021-02-15" @default.
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- W3128780087 date "2021-01-01" @default.
- W3128780087 modified "2023-09-23" @default.
- W3128780087 title "Nanocrystalline semiconductors for thin-film devices by microreactor-assisted chemical solution deposition" @default.
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- W3128780087 doi "https://doi.org/10.1016/b978-0-12-819718-9.00015-7" @default.
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