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- W3129212765 abstract "Block copolymer self-assembly is showing great promise for extending the resolution limits of established, high-throughput photolithography techniques. This technology has the potential to broadly enhance device capabilities ranging from magnetic data storage media to photovoltaic cells to semiconductors. This talk will highlight the journey towards the development of new materials, including synthesis and characterization, and new processing protocols for controlling their thin film structures. Finally, perspectives for their future implementation into commercial lithographic patterning processes will be given." @default.
- W3129212765 created "2021-03-01" @default.
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- W3129212765 date "2021-02-22" @default.
- W3129212765 modified "2023-10-14" @default.
- W3129212765 title "The journey of new materials and processes for directed self-assembly" @default.
- W3129212765 doi "https://doi.org/10.1117/12.2584938" @default.
- W3129212765 hasPublicationYear "2021" @default.
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