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- W3130516567 abstract "Abstract NbN x films were prepared by dual ion beam sputter deposition. Different assisting ion current density J a and assisting ion energy E a were used to modulate the structural and dielectric properties of the films. All the films are of fcc structure, and assisting ions can improve their crystallinity. Higher J a and E a can reduce the screened plasma frequency and the optical energy loss of the films. Importantly, with appropriate experimental parameters, the NbN x films exhibit tunable dual epsilon-near-zero behavior. The assisting ions cause the variation of the carrier concentration in the films, and then modulate the dielectric properties of the films. Our results show that NbN x films can be applied in different fields by tailoring their plasmonic properties by assisting ions." @default.
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- W3130516567 date "2021-06-01" @default.
- W3130516567 modified "2023-10-11" @default.
- W3130516567 title "Plasmonic characteristics of niobium nitride thin films modulated by assisting ions" @default.
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- W3130516567 doi "https://doi.org/10.1016/j.surfin.2021.101024" @default.
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