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• W3132174015 abstract "Abstract Structural and electrical properties of Al-doped Mg x Zn 1−x O films were improved by post-annealing with supplying Zn vapor. The Al-doped Mg x Zn 1−x O films were deposited on glass substrates by a sol-gel method. The substrates were dip-coated with a precursor solution and were dried on a hotplate at 270 °C for 10 min. This dip-coating and drying process was repeated 10 times, and the Al-doped Mg x Zn 1−x O films were obtained after calcination in air at 500 °C for 1 h. The as-grown films were post-annealed in H 2 at 400 °C for 20 min. To supply zinc vapor, a glass slide with a thermally evaporated Zn layer (Zn cap) was put on the sample surface during the post-annealing. The as-grown films had the wurtzite structure with the c -axis perpendicular to the substrate surface, but the intensity of the (002) diffraction peak decreased with increasing Mg content (x). The crystallinity of the films was improved after the post-annealing with a Zn cap, which was observed when x was below 0.1. The resistivity and carrier concentration of the film (x = 0.1) after the post-annealing with a Zn cap was 6.0 × 10 −3 Ωcm and 5.7 × 10 19 cm −3 , respectively. On the other hand, the resistivity of the film (x = 0.1) after the post-annealing without a Zn cap was 6.6 × 10 2 Ωcm. Transmittance spectra in the visible range were not affected by the post-annealing. The optical bandgap of the film (x = 0.1) after the post-annealing with a Zn cap was 3.41 eV." @default.
• W3132174015 created "2021-03-01" @default.
• W3132174015 creator A5052875126 @default.
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• W3132174015 date "2021-02-01" @default.
• W3132174015 modified "2023-10-18" @default.
• W3132174015 title "The effects of the post-annealing with a Zn cap on the structural and electrical properties of sol-gel derived Mg_xZn_1−xO films" @default.
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• W3132174015 doi "https://doi.org/10.1088/2053-1591/abe5f2" @default.
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