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- W3137341567 endingPage "032409" @default.
- W3137341567 startingPage "032409" @default.
- W3137341567 abstract "Eight new atomic layer deposition (ALD) precursors were synthesized using a ligand that is new to the field of ALD: (tBuNH)SiMe2NMe2. Complexes containing Mg, V, Mn, Fe, Co, Ni, and Zn were found to be tetrahedral, and Li complexes form more complex structures. These compounds performed exceptionally well by thermogravimetric analysis (TGA). All compounds except for one Li species and the Fe complex left residual masses below 5%, similar or better than the analogous amidinate complexes. In particular, the Co(II) complex is very thermally robust and performs very well during a TGA stress test, surpassing temperatures above 200 °C. These compounds are the first of a family of precursors containing this type of monoanionic N–Si–N ligand and are prime candidates for ALD process development." @default.
- W3137341567 created "2021-03-29" @default.
- W3137341567 creator A5004448395 @default.
- W3137341567 creator A5029711257 @default.
- W3137341567 creator A5034971620 @default.
- W3137341567 creator A5062534293 @default.
- W3137341567 creator A5078742947 @default.
- W3137341567 creator A5086728720 @default.
- W3137341567 date "2021-05-01" @default.
- W3137341567 modified "2023-10-03" @default.
- W3137341567 title "(<sup>t</sup>BuN)SiMe<sub>2</sub>NMe<sub>2</sub>—A new <i>N,N</i>′-<i>κ</i><sub>2</sub>-monoanionic ligand for atomic layer deposition precursors" @default.
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