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• W3137996929 endingPage "149543" @default.
• W3137996929 startingPage "149543" @default.
• W3137996929 abstract "Titanium nitride (TiN) is a promising plasmonic material alternative to gold and silver thanks to its refractory character, low resistivity (<100 µΩ cm) and compatibility with microelectronic industry processes. Extensive research is currently focusing on the development of magnetron sputtering as a large-scale technique to produce TiN thin films with low resistivity and optimized plasmonic performance. As such, more knowledge on the correlation between process parameters and the functional properties of TiN is needed. Here we report the effect of radiofrequency (RF) substrate biasing during the sputtering process on the structural, optical and electrical properties of TiN films. We employ spectroscopic ellipsometry as a sensible characterization method and we show that a moderate RF power, despite reducing the grain size, allows to achieve optimal plasmonic quality factors and a low resistivity (<100 µΩ cm). This is attributed to the introduction of a slight under-stoichiometry in the material (i.e., TiN0.85), as opposite to the films synthesized without bias or under intense bombardment conditions. RF substrate biasing during magnetron sputtering appears thus as a viable tool to prepare TiN thin films at room temperature with desired plasmonic properties." @default.
• W3137996929 created "2021-03-29" @default.
• W3137996929 creator A5024383903 @default.
• W3137996929 creator A5027062262 @default.
• W3137996929 creator A5048334687 @default.
• W3137996929 creator A5062458146 @default.
• W3137996929 creator A5067593211 @default.
• W3137996929 creator A5087152285 @default.
• W3137996929 creator A5090041354 @default.
• W3137996929 date "2021-07-01" @default.
• W3137996929 modified "2023-10-18" @default.
• W3137996929 title "Controlling the plasmonic properties of titanium nitride thin films by radiofrequency substrate biasing in magnetron sputtering" @default.
• W3137996929 cites W1658959387 @default.
• W3137996929 cites W1679400721 @default.
• W3137996929 cites W1968914474 @default.
• W3137996929 cites W1984646360 @default.
• W3137996929 cites W1985424666 @default.
• W3137996929 cites W1987400858 @default.
• W3137996929 cites W1994188616 @default.
• W3137996929 cites W2002821243 @default.
• W3137996929 cites W2006029086 @default.
• W3137996929 cites W2017780142 @default.
• W3137996929 cites W2023098329 @default.
• W3137996929 cites W2023342382 @default.
• W3137996929 cites W2034284324 @default.
• W3137996929 cites W2035902988 @default.
• W3137996929 cites W2037521233 @default.
• W3137996929 cites W2037664613 @default.
• W3137996929 cites W2039185116 @default.
• W3137996929 cites W2056241212 @default.
• W3137996929 cites W2057965194 @default.
• W3137996929 cites W2059705499 @default.
• W3137996929 cites W2066524206 @default.
• W3137996929 cites W2076450924 @default.
• W3137996929 cites W2083711164 @default.
• W3137996929 cites W2107756428 @default.
• W3137996929 cites W2116232269 @default.
• W3137996929 cites W2119368217 @default.
• W3137996929 cites W2141774548 @default.
• W3137996929 cites W2264991082 @default.
• W3137996929 cites W2398341596 @default.
• W3137996929 cites W2464251174 @default.
• W3137996929 cites W2486544595 @default.
• W3137996929 cites W2519313290 @default.
• W3137996929 cites W2560100450 @default.
• W3137996929 cites W2581302775 @default.
• W3137996929 cites W2592375597 @default.
• W3137996929 cites W2592752843 @default.
• W3137996929 cites W2609570686 @default.
• W3137996929 cites W2620177525 @default.
• W3137996929 cites W2620967522 @default.
• W3137996929 cites W2760199625 @default.
• W3137996929 cites W2766499859 @default.
• W3137996929 cites W2776754482 @default.
• W3137996929 cites W2780126277 @default.
• W3137996929 cites W2782638258 @default.
• W3137996929 cites W2792398621 @default.
• W3137996929 cites W2795488402 @default.
• W3137996929 cites W2801869152 @default.
• W3137996929 cites W2891136212 @default.
• W3137996929 cites W2913765141 @default.
• W3137996929 cites W2914641502 @default.
• W3137996929 cites W2938184622 @default.
• W3137996929 cites W2957125739 @default.
• W3137996929 cites W3014277473 @default.
• W3137996929 cites W3016698783 @default.
• W3137996929 cites W3088771654 @default.
• W3137996929 doi "https://doi.org/10.1016/j.apsusc.2021.149543" @default.
• W3137996929 hasPublicationYear "2021" @default.
• W3137996929 type Work @default.
• W3137996929 sameAs 3137996929 @default.
• W3137996929 citedByCount "14" @default.
• W3137996929 countsByYear W31379969292021 @default.
• W3137996929 countsByYear W31379969292022 @default.
• W3137996929 countsByYear W31379969292023 @default.
• W3137996929 crossrefType "journal-article" @default.
• W3137996929 hasAuthorship W3137996929A5024383903 @default.
• W3137996929 hasAuthorship W3137996929A5027062262 @default.
• W3137996929 hasAuthorship W3137996929A5048334687 @default.
• W3137996929 hasAuthorship W3137996929A5062458146 @default.
• W3137996929 hasAuthorship W3137996929A5067593211 @default.
• W3137996929 hasAuthorship W3137996929A5087152285 @default.
• W3137996929 hasAuthorship W3137996929A5090041354 @default.
• W3137996929 hasBestOaLocation W31379969292 @default.
• W3137996929 hasConcept C110879396 @default.
• W3137996929 hasConcept C111368507 @default.
• W3137996929 hasConcept C119599485 @default.
• W3137996929 hasConcept C127313418 @default.
• W3137996929 hasConcept C127413603 @default.
• W3137996929 hasConcept C165801399 @default.
• W3137996929 hasConcept C171250308 @default.
• W3137996929 hasConcept C19067145 @default.
• W3137996929 hasConcept C191897082 @default.
• W3137996929 hasConcept C192562407 @default.
• W3137996929 hasConcept C194760766 @default.
• W3137996929 hasConcept C20254490 @default.
• W3137996929 hasConcept C22423302 @default.
• W3137996929 hasConcept C2777289219 @default.

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