FRINK Linked Data Fragments server

Matches in SemOpenAlex for { <https://semopenalex.org/work/W3138194785> ?p ?o ?g. }

• W3138194785 endingPage "1432" @default.
• W3138194785 startingPage "1432" @default.
• W3138194785 abstract "This work summarizes the results of our previous studies related to investigations of reactive ion etching kinetics and mechanisms for widely used silicon-based materials (SiC, SiO2, and SixNy) as well as for the silicon itself in multi-component fluorocarbon gas mixtures. The main subjects were the three-component systems composed either by one fluorocarbon component (CF4, C4F8, CHF3) with Ar and O2 or by two fluorocarbon components with one additive gas. The investigation scheme included plasma diagnostics by Langmuir probes and model-based analysis of plasma chemistry and heterogeneous reaction kinetics. The combination of these methods allowed one (a) to figure out key processes which determine the steady-state plasma parameters and densities of active species; (b) to understand relationships between processing conditions and basic heterogeneous process kinetics; (c) to analyze etching mechanisms in terms of process-condition-dependent effective reaction probability and etching yield; and (d) to suggest the set gas-phase-related parameters (fluxes and flux-to-flux ratios) to control the thickness of the fluorocarbon polymer film and the change in the etching/polymerization balance. It was shown that non-monotonic etching rates as functions of gas mixing ratios may result from monotonic but opposite changes in F atoms flux and effective reaction probability. The latter depends either on the fluorocarbon film thickness (in high-polymerizing and oxygen-less gas systems) or on heterogeneous processes with a participation of O atoms (in oxygen-containing plasmas). It was suggested that an increase in O2 fraction in a feed gas may suppress the effective reaction probability through decreasing amounts of free adsorption sites and oxidation of surface atoms." @default.
• W3138194785 created "2021-03-29" @default.
• W3138194785 creator A5004435463 @default.
• W3138194785 creator A5046574035 @default.
• W3138194785 creator A5050720600 @default.
• W3138194785 date "2021-03-15" @default.
• W3138194785 modified "2023-10-14" @default.
• W3138194785 title "On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures" @default.
• W3138194785 cites W1482801385 @default.
• W3138194785 cites W1509917530 @default.
• W3138194785 cites W1562617726 @default.
• W3138194785 cites W1565311360 @default.
• W3138194785 cites W1680053728 @default.
• W3138194785 cites W1680662765 @default.
• W3138194785 cites W1924911799 @default.
• W3138194785 cites W1964054907 @default.
• W3138194785 cites W1973061894 @default.
• W3138194785 cites W1982794934 @default.
• W3138194785 cites W1988544159 @default.
• W3138194785 cites W1990097706 @default.
• W3138194785 cites W1990890175 @default.
• W3138194785 cites W1993439000 @default.
• W3138194785 cites W1996303146 @default.
• W3138194785 cites W1997256396 @default.
• W3138194785 cites W2000461969 @default.
• W3138194785 cites W2004216860 @default.
• W3138194785 cites W2006359217 @default.
• W3138194785 cites W2007392560 @default.
• W3138194785 cites W2011269214 @default.
• W3138194785 cites W2012679140 @default.
• W3138194785 cites W2030287484 @default.
• W3138194785 cites W2037615680 @default.
• W3138194785 cites W2042936325 @default.
• W3138194785 cites W2046836154 @default.
• W3138194785 cites W2048536636 @default.
• W3138194785 cites W2057185012 @default.
• W3138194785 cites W2057667668 @default.
• W3138194785 cites W2061540069 @default.
• W3138194785 cites W2062526717 @default.
• W3138194785 cites W2062824111 @default.
• W3138194785 cites W2070020495 @default.
• W3138194785 cites W2077420474 @default.
• W3138194785 cites W2081963956 @default.
• W3138194785 cites W2088710695 @default.
• W3138194785 cites W2094202952 @default.
• W3138194785 cites W2105340803 @default.
• W3138194785 cites W2105477410 @default.
• W3138194785 cites W2110200822 @default.
• W3138194785 cites W2117463812 @default.
• W3138194785 cites W2126204863 @default.
• W3138194785 cites W2136298824 @default.
• W3138194785 cites W2169038302 @default.
• W3138194785 cites W2172065341 @default.
• W3138194785 cites W2172081141 @default.
• W3138194785 cites W2226648402 @default.
• W3138194785 cites W2332225081 @default.
• W3138194785 cites W2600106934 @default.
• W3138194785 cites W2612271297 @default.
• W3138194785 cites W2612466803 @default.
• W3138194785 cites W2768379846 @default.
• W3138194785 cites W2811070559 @default.
• W3138194785 cites W2895062609 @default.
• W3138194785 cites W2900270743 @default.
• W3138194785 cites W2921554789 @default.
• W3138194785 cites W2921745741 @default.
• W3138194785 cites W2947096838 @default.
• W3138194785 cites W3013282652 @default.
• W3138194785 cites W3028587958 @default.
• W3138194785 cites W3034733070 @default.
• W3138194785 cites W3042288412 @default.
• W3138194785 cites W3110258885 @default.
• W3138194785 doi "https://doi.org/10.3390/ma14061432" @default.
• W3138194785 hasPubMedCentralId "https://www.ncbi.nlm.nih.gov/pmc/articles/7999134" @default.
• W3138194785 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/33804274" @default.
• W3138194785 hasPublicationYear "2021" @default.
• W3138194785 type Work @default.
• W3138194785 sameAs 3138194785 @default.
• W3138194785 citedByCount "11" @default.
• W3138194785 countsByYear W31381947852022 @default.
• W3138194785 countsByYear W31381947852023 @default.
• W3138194785 crossrefType "journal-article" @default.
• W3138194785 hasAuthorship W3138194785A5004435463 @default.
• W3138194785 hasAuthorship W3138194785A5046574035 @default.
• W3138194785 hasAuthorship W3138194785A5050720600 @default.
• W3138194785 hasBestOaLocation W31381947851 @default.
• W3138194785 hasConcept C100460472 @default.
• W3138194785 hasConcept C113196181 @default.
• W3138194785 hasConcept C121332964 @default.
• W3138194785 hasConcept C127413603 @default.
• W3138194785 hasConcept C130472188 @default.
• W3138194785 hasConcept C145148216 @default.
• W3138194785 hasConcept C148898269 @default.
• W3138194785 hasConcept C159467904 @default.
• W3138194785 hasConcept C178790620 @default.
• W3138194785 hasConcept C185592680 @default.
• W3138194785 hasConcept C192562407 @default.
• W3138194785 hasConcept C2776875633 @default.
• W3138194785 hasConcept C2779227376 @default.

• next