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- W3138682823 abstract "Although being the optical lithography, the extreme ultraviolet (EUV) lithography with 13.5-nm wavelength is very different from the deep ultraviolet (DUV) lithography with 193-nm wavelength. Hence, the understanding of the complex detailed EUV mechanisms to cause a chemical reaction in chemically amplified resists (CARs) is required to develop EUV resists and exposure process. In this paper, for organic, metal-organic and metal-oxide resists, the electron-scattering model of exposure mechanisms needs to include the elastic and inelastic mean free paths. On top of that, Dill’s parameters of DUV and EUV resisters from the photo-generated reaction are discussed to indicate the physical and chemical characteristics. For CAR and EUV resists, Dill B parameter is large than Dill A and B parameters." @default.
- W3138682823 created "2021-03-29" @default.
- W3138682823 creator A5045195859 @default.
- W3138682823 date "2021-08-01" @default.
- W3138682823 modified "2023-09-23" @default.
- W3138682823 title "Understanding the Exposure Process in the Extreme Ultra Violet Lithography" @default.
- W3138682823 doi "https://doi.org/10.1166/jnn.2021.19412" @default.
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