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- W3140428269 abstract "IZO films were deposited onto PET substrate at room temperature with the inclined opposite target type DC magnetron sputtering equipment,in which a sintered oxide IZO target(doped with 10% ZnO,packing density of 99.99%) was used.The effects of total sputtering pressure and film thickness on IZO films properties were studied.All the films produced at room temperature have a amorphous structure,irrespective of the total sputtering pressure and film thickness.A resistivity of the order of 10-4 Ωcm was obtained for IZO films deposited at lower pressure(film thickness of 190 nm).The resistivity of IZO films deposited at room temperature depends on film thickness and shows a minimum at a thickness of 530 nm." @default.
- W3140428269 created "2021-04-13" @default.
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- W3140428269 date "2009-01-01" @default.
- W3140428269 modified "2023-09-25" @default.
- W3140428269 title "Effect of process parameters on electrical,optical properties of IZO films produced by inclination opposite target type DC magnetron sputtering" @default.
- W3140428269 hasPublicationYear "2009" @default.
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