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- W3142023160 abstract "The H+ sensitive behavior of Ta2O5 has ben reported on the letter. The magnetron-sputtering method was chosen for the Ta2O5 membranedeposition. C-V measurments of MIS structures were uesd for evaluatingthe stability of the membranes. It is shown that the effective interface charge density is 3 ×1012 / cm2 and the motive charge density is 6.91×1010 / cm2. The pH response of the membranes was measured by connecting the sousing membranes with a JFET. The typical sensitivityis 46 (pH7) and 25 (pH7) respectly. High sensitivity can be achivedby reducing the thickness of the membranes and oxygen Partial Pressure when sputtering. The Ta2O5 provid higher sensitivity and better stability than that other." @default.
- W3142023160 created "2021-04-13" @default.
- W3142023160 creator A5087026683 @default.
- W3142023160 date "1994-01-01" @default.
- W3142023160 modified "2023-09-25" @default.
- W3142023160 title "THE ION SENSITIVE BEHAVIOR OF Ta_2O_5 MEMBRANE" @default.
- W3142023160 hasPublicationYear "1994" @default.
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