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- W3143012389 abstract "Beta-tin has been used widely as an interconnect in modern electronics. To improve the understanding of the reliability of these components, we directly measure the critical resolved shear stress of individual slip systems in beta-tin using micropillar compression tests at room temperature with crystal orientations near-[100] and [001] in the loading direction within a large grain high purity tin (99.99%) sample. This activates the (110)[1-11]/2, (110)[1-1-1]/2, (010)[001] and (110)[001] slip systems. Analysis of the slip traces and load-displacement curves enables measurement of the critical resolved shear stress for epsilon=10^(-4) of tau_(CRSS)^({110}<1-11>/2)=10.4+/-0.4 and tau_(CRSS)^({010}<001>)=3.9+/-0.3 MPa." @default.
- W3143012389 created "2021-04-13" @default.
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- W3143012389 date "2021-04-06" @default.
- W3143012389 modified "2023-10-18" @default.
- W3143012389 title "Accessing slip activity in high purity tin with electron backscatter diffraction and measurement of slip strength" @default.
- W3143012389 doi "https://doi.org/10.48550/arxiv.2104.02681" @default.
- W3143012389 hasPublicationYear "2021" @default.
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