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- W3143146411 abstract "相对一致的铋铜电影是 electrodeposited 在之间 ? 15 并且 ? 在包含 4 mmol/L 铋离子和 2 mmol/L 铜的硫酸盐电解质的 20 mV 离子。仅仅铜是 electrodeposited 在 ? 5 mV。树枝状的铋铜电影是 electrodeposited 在下面 ? 20 mV。cathodic 水流变得不变在之间 ? 20 并且 ? 400 mV。因此，从充电的铋铜电极淀积变化转控制到散开控制在 ? 20 mV。在另一方面，一致铋铜电影是 electrodeposited 在之间 ? 5 并且 ? 在包含 4 mmol/L 铋离子和 2 mmol/L 铜的 methanesulfonate 电解质的 35 mV 离子。树枝状的铋铜电影是 electrodeposited 在下面 ? 35 mV。为在 methanesulfonate 电解质的好 electrodepositon 的潜在的区域在硫酸盐电解质是比那宽的。因此，由使用 methanesulfonate 电解质控制电极淀积条件是容易的。" @default.
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- W3143146411 date "2009-01-01" @default.
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- W3143146411 title "Bi-Cu film deposition in aqueous solutions" @default.
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