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- W3143158363 abstract "铟锡氧化物电影被 In-Sn 合金的反应蒸发与 1.3 脳的一个氧压力在玻璃底层上在不同底层温度准备了 10 ? 1 Pa 和免职 10 评价 ? 2 nm/s。获得的最好的 ITO 电影有 4.35 脳的一个电的抵抗力 10 ? 4 惟路 c m， 4.02 脳的搬运人集中 1020 厘米 ? 3，并且 67.5 cm2v 的霍尔活动性 ? 1s ? 1。获得的电影的结构、光、电的性质上的底层温度的影响被调查了。CLC 数字 O484.1 这个工作被天津(No.06YFGZGX02100 ) 的关键科技的工程支持，国家关键基本研究开发的工程中国计划(Nos. 2006CB202602， 2006CB202603 ) 并且天津(Nos.05YFJMJC01600,06YFJZJC 01700 ) 的自然科学基础。" @default.
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- W3143158363 date "2007-01-01" @default.
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- W3143158363 title "Preparation of Indium Tin Oxide films deposited by reactive evaporation at different substrate-temperature and the properties" @default.
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