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- W3144035318 startingPage "217" @default.
- W3144035318 abstract "Micro and nanofabrication technologies are integral to the development of miniaturized systems. LithographyLithography plays a key role in micro and nanofabrication techniques. Since high functional miniaturized systems are required in various fields, such as the development of a semiconductor, chemical and biological analysis, and biomedical researches, lithography techniques have been developed and applied for their appropriate purpose. Lithography can be classified into conventional and unconventional lithography, or top-down and bottom-up, or with mask and mask-less approaches. In this chapter, various lithography techniques are categorized and classified into conventional and unconventional lithography. In the first part, photolithography, electron beam, and focused-ion beam lithography are introduced as conventional lithography techniques. The second part introduces nanoimprint lithography, deformation lithography, and colloidal lithography as unconventional lithography techniques. In the last part, the pros and cons of each lithography are discussed for an appropriate design of fabrication processes." @default.
- W3144035318 created "2021-04-13" @default.
- W3144035318 creator A5002858827 @default.
- W3144035318 creator A5055100242 @default.
- W3144035318 creator A5057257626 @default.
- W3144035318 creator A5084465908 @default.
- W3144035318 date "2021-01-01" @default.
- W3144035318 modified "2023-10-14" @default.
- W3144035318 title "Lithography Technology for Micro- and Nanofabrication" @default.
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