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- W3144246399 abstract "铟氧化亚锡(ITO ) 电影与上面的相对高的免职率在聚酯， Si 和玻璃底层上被准备由 DC 反应磁控管劈啪作响的 0.9 nm/s 在 0.06 Pa 系统的劈啪作响的压力的技术分别地。免职参数上的抵抗力的依赖例如免职率， target-to-substrate 距离(TSD ) ，氧流动率和劈啪作响的时间(厚度) ，被调查了，和结构并且光性质。所有 ITO 电影展出了格子扩大，这被揭示。ITO 薄电影的抵抗力显示出重要底层效果：低得多的抵抗力和更宽广的过程窗户 reproducibly 为 ITO 电影的免职被完成了到在 Si 和玻璃底层上准备的聚酯而非那些上。有抵抗力的电影象 4.23 x 10 ^-4 Ω厘米和～ 7 的平均发射度一样低 8% 在 400 ～ 7 的波长， 00 nm 在房间温度在聚酯上为这些电影被完成了。" @default.
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- W3144246399 date "2000-01-01" @default.
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- W3144246399 title "Properties of Reactive Magnetron Sputtered ITO Films without in-situ Substrate Heating and Post-deposition Annealing" @default.
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