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- W3147300017 abstract "-We deposited SiO2 thin films by CO2 laser-assisted PECVD process from N2O-SiH4-Ar gas mixtures, with and without resistive heating. Depositions were carried out using capacitively coupled RF PECVD, while simultaneously under CO2 laser irradiation. As compared to films grown under a conventional PECVD process, these films exhibited lower surface leakage currents and higher breakdown voltage. Greater improvements occurred when the process used longer wavelengths and higher CO2 laser power, which revealed a photonic, rather than thermal, function of laser irradiation in the process." @default.
- W3147300017 created "2021-04-13" @default.
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- W3147300017 date "2007-12-01" @default.
- W3147300017 modified "2023-09-23" @default.
- W3147300017 title "Reduction of surface recombination current by optimized ledge technology" @default.
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