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- W3148768184 abstract "Infrared spectra of 1 3 samples of amorphous silicon bonded with hydrogen, fluorine and carbon, prepared by electrodeposition using a mixture of ethylene glycol and fluosilicic acid were analysed in the wave number region 4000-400 cm -1 with a Fourier transform infrared spectrometer. Strong absorption peaks were observed at 1000 cm -1 due to the SiF, stretching mode. Small peaks were seen around 2300 and 640 cm -1 due to s i r stretching and wagging modes of absorption. The number of bonded hydrogen atoms in the film deposited at 0.05 M, 50 mA cm -2 was calculated to be 6.2579 x 1021 and 1.2302 x 1020 atm cm -3 using integrated absorption of the CH and s i r stretching modes, respectively. The absorption coefficient around the SiF, stretch region was found to vary from 1300-2500 cm -1 as the molarity of the electrolyte was increased. Binding energy shifts in X-ray photoelectron spectrum were used as a cross check to confirm the silicon bonding with carbon, hydrogen, oxygen and fluorine atoms. The absence of columnar growth in SEM photographs indicates no polysilane formation in the films." @default.
- W3148768184 created "2021-04-13" @default.
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- W3148768184 date "2004-01-01" @default.
- W3148768184 modified "2023-09-27" @default.
- W3148768184 title "Vibrational modes in electrodeposited amorphous silicon: FT-IR analysis" @default.
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- W3148768184 hasPublicationYear "2004" @default.
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