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- W3148936227 abstract "Large positive drifts in the emitter-base breakdown voltage (BVebo) by as much as 1.5 volts have been observed on devices utilizing blanket deposited silicon nitride layers. The large magnitude of the drift has been explained by the electrical neutralization of boron by the formation of boron-hydrogen bonds when the emitter-base junction is avalanched. The blanket nitride layer acts as a some of hydrogen as well as a barrier which uaps hydrogen in the oxide under the nitride layer." @default.
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- W3148936227 date "1992-01-01" @default.
- W3148936227 modified "2023-09-27" @default.
- W3148936227 title "Hot Electron Induced Hydrogen Compensation of Boron Doped Silicon Resulting From Emitter-Base Breakdown" @default.
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