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- W3149233411 abstract "It is important to acquire the composition of Si1-xGex layer, especially that with high Ge content, epitaxied on Si substrate. Two nondestructive examination methods, double crystals X-ray diffraction (DCXRD) and micro-Raman measurement, were introduced comparatively to determine x value in Si1-xGex layer, which show that while the two methods are consistent with each other when x is low, the results obtained from double crystals X-ray diffraction are not credible due to the large strain relaxation occurring in Si1-xGex layers when Ge content is higher than about 20%. Micro-Raman measurement is more appropriate for determining high Ge content than DCXRD." @default.
- W3149233411 created "2021-04-13" @default.
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- W3149233411 date "2006-01-01" @default.
- W3149233411 modified "2023-09-26" @default.
- W3149233411 title "Comparison between Double Crystals X-ray Diffraction and Micro-Raman Measurement on Composition Determination of High Ge Content Si_(1-x)Ge_x Layer Epitaxied on Si Substrate" @default.
- W3149233411 hasPublicationYear "2006" @default.
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