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- W3149450942 abstract "为基于表面的干扰,电浆子挥动的 248 nm 的一种新影印石版术技术被使用计算机模拟建议并且示威。基本结构由表面电浆子电磁声子(SPP ) 组成干扰面具和多层的电影 superlens。用迅速凋落的波浪上的 superlens 的扩大效果,近的地 SPP 干扰模式被想象到远地,然后在相片上被暴露抵抗(PR ) 。模拟基于有限差别时间结果当从 248 nm 来源的 p 极化光是时,在干扰模式的半最大值(FWHM ) 的完整的宽度是大约 19 nm 的领域(FDTD ) 方法表演垂直地事件到结构。同时,焦点的深度为积极 PR 是为否定 PR 和 60 nm 的 150 nm,它在平常的 SPP 影印石版术比那大得多。" @default.
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- W3149450942 date "2014-01-01" @default.
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- W3149450942 title "248 nm imaging photolithography assisted by surface plasmon polariton interference" @default.
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