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- W3150218916 abstract "Plasma Ni Cr surface alloying was applied on mild steel by Double Glow Plasma Surface Alloying Process. The sputtering and absorption of alloy elements, two basic processes that determined the kinetics of the alloying process, were investigated on the basis of discharge and sputtering theories and the experiment results. The study indicated that the alloying process was effected remarkably by the discharge parameters. The sputtering efficiency of the sputtering target was determined by the voltage applied on it and also the discharge pressure. High voltage and low discharge pressure were favorable. The absorption ratio was irrelevant with the sputtering process, while the discharge pressure and substrate bias should be chosen moderately to obtain the highest efficiency of the alloying process, the optimums being 40Pa and 400V respectively. Besides, the distance between sputtering target and substrate also affected the absorption ratio. Reducing distance was beneficial to the absorption process especially when it was at 20mm or shorter. The close correlation between the distance and the absorption ratio might result in the non-uniformity of the alloyed layer since it was inevitable that there would be some difference in the distance in practical operations, so the selection of distance should be considered in association with the specific processing condition. With certain sputtering supply of alloy elements, the larger the ratio of the absorption, the higher the quality of the alloyed layer. The absorption ratio should be the main concern with respect to the optimization of the processing conditions." @default.
- W3150218916 created "2021-04-13" @default.
- W3150218916 creator A5018862380 @default.
- W3150218916 date "1999-01-01" @default.
- W3150218916 modified "2023-09-25" @default.
- W3150218916 title "STUDY ON ABSORPTION RATIO OF ALLOY ELEMENTS IN PLASMA Ni Cr ALLOYING BY DOUBLE GLOW PLASMA PROCESS" @default.
- W3150218916 hasPublicationYear "1999" @default.
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