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- W3150932083 abstract "The sheath plasma characteristics changing with the negative bias applied to the substrate during electron cyclotron resonance plasma nitriding are studied. The sheath characteristics obtained by a Langmuir single probe and an ion energy analyzer show that when the negative bias applied to the substrate is increasing, the most probable energy of ions in the sheath and the full width of half maximum of ions energy distribution increase, the thickness of the sheath also increases, whereas the saturation current of ion decreases. It has been found from the optical emission spectrum that there are strong lines of N2 and N+2. Based on our experiment results the mechanism of plasma nitriding is discussed." @default.
- W3150932083 created "2021-04-13" @default.
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- W3150932083 date "2001-01-01" @default.
- W3150932083 modified "2023-09-26" @default.
- W3150932083 title "Sheath Characteristic in ECR Plasma Nitriding" @default.
- W3150932083 hasPublicationYear "2001" @default.
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