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- W3152356191 abstract "Vanadium dioxide exhibits a thermally-induced reversiblesemiconductor-to-metal phase transition near 67℃.In the present work,VO_2 thin filmshave been prepared by the Sol-Gel dip-coating technique on monocrystalline Si(111),silica glass and soda-lime-silica glass substrates and vacuum heat treatement at 500℃ for2h.The variable-temperature IR spectra were taken during heating and cooling betweenroom temperature and 100℃.The structure of VO_2 thin films was analyzed by X-raydiffraction.The experimental results show that semiconductor-to-metal phase transitionocccurs at 67℃,the transmittance change due to the phase transition is 40% at 2.5μm and45% at 5.0/μm,the IR spectra of the VO_2 thin films do not change during heating andcooling,whereas the films crystallize after vacuum heat treatment.The results can be ex-plained using the band model proposed by J.B.Goodenough in 1965." @default.
- W3152356191 created "2021-04-13" @default.
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- W3152356191 date "1990-01-01" @default.
- W3152356191 modified "2023-09-25" @default.
- W3152356191 title "PHASE TRANSITION OF VO_2 THIN FILMS PREPARED BY DIP-COATING TECHNIQUE" @default.
- W3152356191 hasPublicationYear "1990" @default.
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