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- W3156787467 abstract "Metasurfaces are composed of periodic sub-wavelength nanostructures and exhibit optical properties that are not found in nature. They have been widely investigated for optical applications such as holograms, wavefront shaping, and structural color printing, however, electron-beam lithography is not suitable to produce large-area metasurfaces because of the high fabrication cost and low productivity. Although alternative optical technologies, such as holographic lithography and plasmonic lithography, can overcome these drawbacks, such methods are still constrained by the optical diffraction limit. To break through this fundamental problem, mechanical nanopatterning processes have been actively studied in many fields, with nanoimprint lithography (NIL) coming to the forefront. Since NIL replicates the nanopattern of the mold regardless of the diffraction limit, NIL can achieve sufficiently high productivity and patterning resolution, giving rise to an explosive development in the fabrication of metasurfaces. In this review, we focus on various NIL technologies for the manufacturing of metasurfaces. First, we briefly describe conventional NIL and then present various NIL methods for the scalable fabrication of metasurfaces. We also discuss recent applications of NIL in the realization of metasurfaces. Finally, we conclude with an outlook on each method and suggest perspectives for future research on the high-throughput fabrication of active metasurfaces." @default.
- W3156787467 created "2021-04-26" @default.
- W3156787467 creator A5029883571 @default.
- W3156787467 creator A5033298230 @default.
- W3156787467 creator A5049029303 @default.
- W3156787467 creator A5049452138 @default.
- W3156787467 creator A5073142354 @default.
- W3156787467 creator A5076607356 @default.
- W3156787467 date "2021-04-13" @default.
- W3156787467 modified "2023-10-13" @default.
- W3156787467 title "Nanoimprint lithography for high-throughput fabrication of metasurfaces" @default.
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