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- W3159240221 abstract "Due to the high density of native defects, the prototypical topological insulator (TI), ${mathrm{Bi}}_{2}{mathrm{Se}}_{3}$, is naturally $n$-type. Although ${mathrm{Bi}}_{2}{mathrm{Se}}_{3}$ can be converted into $p$-type by substituting $2+$ ions for Bi, only light elements such as Ca have so far been effective as the compensation dopant. Considering that strong spin-orbit coupling (SOC) is essential for the topological surface states, a light element is undesirable as a dopant because it weakens the strength of SOC. In this sense, Pb, which is the heaviest $2+$ ion, located right next to Bi in the Periodic Table, is the most ideal $p$-type dopant for ${mathrm{Bi}}_{2}{mathrm{Se}}_{3}$. However, Pb-doping has so far failed to achieve $p$-type ${mathrm{Bi}}_{2}{mathrm{Se}}_{3}$ not only in thin films but also in bulk crystals. Here, by utilizing an interface engineering scheme, we have achieved the first Pb-doped $p$-type ${mathrm{Bi}}_{2}{mathrm{Se}}_{3}$ thin films. Furthermore, at heavy Pb-doping, the mobility turns out to be substantially higher than that of Ca-doped samples, suggesting that Pb is a less disruptive dopant than Ca. The availability of Pb-doped $p$-type ${mathrm{Bi}}_{2}{mathrm{Se}}_{3}$ films will provide opportunities to study a Fermi-level tunable TI system while preserving the SOC strength." @default.
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- W3159240221 date "2021-03-18" @default.
- W3159240221 modified "2023-10-07" @default.
- W3159240221 title "Pb-doped p -type Bi 2 Se 3 thin films via interfacial engineering" @default.
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