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• W3173128081 endingPage "3191" @default.
• W3173128081 startingPage "3191" @default.
• W3173128081 abstract "We report the surface stoichiometry of Tix-CuyNz thin film as a function of film depth. Films are deposited by high power impulse (HiPIMS) and DC magnetron sputtering (DCMS). The composition of Ti, Cu, and N in the deposited film is investigated by X-ray photoelectron spectroscopy (XPS). At a larger depth, the relative composition of Cu and Ti in the film is increased compared to the surface. The amount of adventitious carbon which is present on the film surface strongly decreases with film depth. Deposited films also contain a significant amount of oxygen whose origin is not fully clear. Grazing incidence X-ray diffraction (GIXD) shows a Cu3N phase on the surface, while transmission electron microscopy (TEM) indicates a polycrystalline structure and the presence of a Ti3CuN phase." @default.
• W3173128081 created "2021-06-22" @default.
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• W3173128081 date "2021-06-09" @default.
• W3173128081 modified "2023-10-14" @default.
• W3173128081 title "Surface Stoichiometry and Depth Profile of Tix-CuyNz Thin Films Deposited by Magnetron Sputtering" @default.
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• W3173128081 doi "https://doi.org/10.3390/ma14123191" @default.
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• W3173128081 hasPublicationYear "2021" @default.
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