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- W3183670653 abstract "Electrochemical etching of macropores in Si can be done either randomly (wild pores) or lithographically defined. When the points to be etched are not defined, the etching process starts at defects, or statistically distributed on the surface, just limited by the space-charge-region created in the semiconductor as effect of the electric field applied [1]. Ordered pores are usually accomplished by lithography plus a preliminary etching step for the formation of inverted pyramids [2]. At the pits of the pyramids the electric field is more intense during the electrochemical etching process, causing that the probability to etch pores is higher at those points. Defining the positions where pores are etched is necessary for different applications, where order is important. However, this makes the process to produce pores, which is not necessarily clean, more expensive with the need clean-room appliances (masking layer deposition and lithography)." @default.
- W3183670653 created "2021-08-02" @default.
- W3183670653 creator A5003701887 @default.
- W3183670653 date "2021-05-30" @default.
- W3183670653 modified "2023-09-27" @default.
- W3183670653 title "(Invited) Scratch Controled Electrochemical Production of Macropores in Silicon" @default.
- W3183670653 doi "https://doi.org/10.1149/ma2021-01311037mtgabs" @default.
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