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- W3185675102 abstract "In this work, the surface of indium tin oxides (ITO) was treated with argon plasma at different plasma exposure times, namely 4, 6, and 8 min. The effect of treatment on the physical properties of ITOs and the performance of organic light-emitting diodes (OLEDs) using a glass/ITO/PEDOT: PSS/Alq3/Al structure were investigated. The ITOs were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), and visible-ultraviolet (UV–vis) spectroscopy. Based on the results, the treatment does not change the structure and transparency of ITOs; however, it improves the surface morphology and reduces the value of the surface roughness of ITOs. OLEDs fabricated by the current density profile, resistance, and radiation were investigated. The study results showed a decrease in turn-on voltage (from 5.7 to 3 V) and resistance on the one hand, and an increase in irradiance due to surface treatment by plasma on the other hand." @default.
- W3185675102 created "2021-08-02" @default.
- W3185675102 creator A5026935855 @default.
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- W3185675102 date "2021-10-01" @default.
- W3185675102 modified "2023-10-14" @default.
- W3185675102 title "The effects of argon plasma treatment on ITO properties and the performance of OLED devices" @default.
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- W3185675102 doi "https://doi.org/10.1016/j.optmat.2021.111400" @default.
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