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- W3198150592 abstract "Molybdenum films deposited on a fused silica substrate by magnetron sputtering were investigated. Two types of film textures were identified: nucleation textures and growth textures. The experimental results showed that the nucleation texture of molybdenum films is characterized by the <110> axis, perpendicular to the substrate surface. Theoretical studies based on the atomistic theory of nucleation showed that the work of nucleation with the (110) orientation is the smallest in comparison with the work of nucleation of all other orientations. It was found that during film growth under the characteristic deposition conditions of the structural zone T, a transformation of the (110) nucleation texture into the (211) growth texture is observed, which is probably due to minimization of the overall energy of the growing film. It was found that increasing the working gas pressure within the range of 0.39 Pa–0.74 Pa reduces the thickness of the molybdenum film at which the texture (110) changes to the texture (211) by 30–40%. The work of formation of the Mo critical nucleus having the (111), (100), (211), and (110) orientations in conditions of various supersaturation of the system. It should be noted that the successive attachment of atoms to the nucleus occurs in the most energetically favorable sites corresponding to the appearance of the maximum number of bonds. • Molybdenum films were fabricated on fused silica substrates by magnetron sputtering •Determination of the nucleation texture by the atomistic theory of nucleation •Nucleation texture (110) is formed at the initial stage of molybdenum film growth •Texture (110) is transformed to texture (211) with an increase of Mo film thickness" @default.
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- W3198150592 date "2021-12-01" @default.
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- W3198150592 title "Preferred growth of molybdenum thin films during magnetron sputtering" @default.
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- W3198150592 doi "https://doi.org/10.1016/j.jssc.2021.122543" @default.
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