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- W3199835303 abstract "Thin films of Nb2O5 and Ta2O5 are readily synthesized using DC magnetron sputtering. Using Nb or Ta sputtering targets with controlled Ar and oxygen flow rates enabled the synthesization of thin films of Nb and Ta oxides with variable oxygen contents and thicknesses. Using this technique, we succeeded to synthesize a variable oxygen content metal oxide. Deposition powers were varied from 200W for Ta (or Nb) up to 300W. Ta2O2 and Nb2O5 thin films were deposited on Si and glass substrates under the same circumstances. X-ray diffraction (XRD) study of the thin films showed an amorphous structure. Scanning electron microscope (SEM) confirmed the homogeneity of the thin film composition, the uniformity of the surface, and provided a precise measure of the thickness. Energy dispersive x-ray spectroscopy (EDX) confirmed the purity and the elemental composition of the thin films. Optical parameters, thin film thickness, roughness, refractive index, extinction coefficient, and energy bandgap were extracted by using variable angle spectroscopic ellipsometry (VASE). A high refractive index, wide energy bandgap, and highly transparent thin films were successfully achieved, with thermodynamic stability. These characteristics allowed Ta2O5 and Nb2O5 to be eligible for high-k materials applications such as CMOS and energy storage devices." @default.
- W3199835303 created "2021-09-27" @default.
- W3199835303 creator A5052153611 @default.
- W3199835303 date "2020-01-01" @default.
- W3199835303 modified "2023-09-24" @default.
- W3199835303 title "TUNING THE OXYGEN CONTENT AND THICKNESS OF THE SPUTTERED TA AND NB OXIDES NANOSTRUCTURED THIN FILMS FOR THE HIGH-K MATERIALS APPLICATIONS" @default.
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