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• W3201186942 abstract "When a nominally flat surface is bombarded with a broad ion beam at oblique incidence, nanoscale ripples often develop on the surface. For high angles of incidence, surfaces typically develop into a terraced form at the late stages of their time evolution. In the present work, this process is exploited to prevent unwanted smoothing of ordered terraced substrates during the deposition of thin films. A Si surface prepatterned with a 500 nm pitch binary grating structure was bombarded at oblique incidence by a low energy Xe+ ion beam to establish an ordered terraced topography. Subsequently, Si/SiO2 bilayers were deposited on the surface, and further oblique incidence Xe+ bombardment was performed following the deposition of each Si layer to re-establish the ordered terraced topography. Self-organized processes, such as in the present work, that only require exposure of a surface to a plasma or ion source have the potential to provide a simple and inexpensive route for fabricating large-area nanostructured surfaces. The presented procedure has potential applications in the fabrication of multilayer blazed gratings for use in the extreme ultraviolet or soft x-ray regimes." @default.
• W3201186942 created "2021-09-27" @default.
• W3201186942 creator A5019564350 @default.
• W3201186942 creator A5042231502 @default.
• W3201186942 creator A5050848787 @default.
• W3201186942 date "2021-09-23" @default.
• W3201186942 modified "2023-10-13" @default.
• W3201186942 title "Deposition of conformal thin film coatings on sawtooth substrates using ion bombardment" @default.
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• W3201186942 doi "https://doi.org/10.1063/5.0060699" @default.
• W3201186942 hasPublicationYear "2021" @default.
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