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- W3201476685 abstract "To establish high-bandwidth chip-to-chip interconnects in optoelectronic integrated circuits, requires high-performance photon emitters and signal receiving components. Regarding the photodetector, fast device concepts like Schottky junction devices, large carrier mobility materials and shrinking the channel length will enable higher operation speed. However, integrating photodetectors in highly scaled ICs technologies is challenging due to the efficiency-speed trade-off. Here, we report a scalable and CMOS-compatible approach for an ultra-scaled germanium (Ge) based photodetector with tunable polarity. The photodetector is composed of a Ge Schottky barrier field effect transistor with monolithic aluminum (Al) source/drain contacts, offering plasmon assisted and polarization-resolved photodetection. The ultra-scaled Ge photodetector with a channel length of only 200 nm shows high responsivity of about R = 424 A W−1 and a maximum polarization sensitivity ratio of TM/TE = 11." @default.
- W3201476685 created "2021-09-27" @default.
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- W3201476685 date "2021-10-06" @default.
- W3201476685 modified "2023-10-16" @default.
- W3201476685 title "Plasmon-assisted polarization-sensitive photodetection with tunable polarity for integrated silicon photonic communication systems" @default.
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- W3201476685 doi "https://doi.org/10.1088/1361-6528/ac2848" @default.
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