Matches in SemOpenAlex for { <https://semopenalex.org/work/W3203085507> ?p ?o ?g. }
Showing items 1 to 94 of
94
with 100 items per page.
- W3203085507 abstract "We present a comparison of the properties of the Mo/Si multilayers deposited by three techniques: secondary ion beam deposition (IBD), DC magnetron sputtering (MS), and biased-target ion beam deposition (BTIBD). Based on sputter simulations, we demonstrate that the energetics of the depositing adatoms and the intermixing depth depend strongly on the target/beam voltage, process pressure and target-to-substrate distance. XRR measurements indicate that the multilayers deposited by MS are much rougher than those deposited by IBD and BTIBD. SIMS and RBS measurements suggest that the Mo layers have low contamination of Fe and Al indicating insignificant beam overspray onto the target mounting material, as well as minimal Ar implantation. High-resolution TEM analysis shows intermixed layer thickness in the range of 0.3 to 1.9 nm and interfacial roughness in the range of 100 to 500 pm. Optical calculations suggest that the observed level of contamination is expected to have minimal impact on the EUV peak reflectivity. The intermixed layers could result in a 2-5% decrease in peak reflectivity. Further, the optical simulations predict that the 100-200pm range interfacial roughness in IBD and BTIBD cause a <0.5% reduction in peak reflectivity, whereas the 200-500pm range interfacial roughness in MS films is expected to compromise the peak reflectivity by up to 5%. This comparison of a variety of thin film techniques for the deposition of Mo and Si has allowed us to gain a deeper insight into the challenges faced during the fabrication of EUV mask blanks." @default.
- W3203085507 created "2021-10-11" @default.
- W3203085507 creator A5004819366 @default.
- W3203085507 creator A5019269752 @default.
- W3203085507 creator A5031406677 @default.
- W3203085507 creator A5033911783 @default.
- W3203085507 creator A5034268232 @default.
- W3203085507 creator A5086031103 @default.
- W3203085507 date "2021-10-01" @default.
- W3203085507 modified "2023-09-27" @default.
- W3203085507 title "Comparison of deposition techniques for Mo/Si reflective multilayers for EUV mask blanks" @default.
- W3203085507 doi "https://doi.org/10.1117/12.2600972" @default.
- W3203085507 hasPublicationYear "2021" @default.
- W3203085507 type Work @default.
- W3203085507 sameAs 3203085507 @default.
- W3203085507 citedByCount "0" @default.
- W3203085507 crossrefType "proceedings-article" @default.
- W3203085507 hasAuthorship W3203085507A5004819366 @default.
- W3203085507 hasAuthorship W3203085507A5019269752 @default.
- W3203085507 hasAuthorship W3203085507A5031406677 @default.
- W3203085507 hasAuthorship W3203085507A5033911783 @default.
- W3203085507 hasAuthorship W3203085507A5034268232 @default.
- W3203085507 hasAuthorship W3203085507A5086031103 @default.
- W3203085507 hasConcept C107365816 @default.
- W3203085507 hasConcept C111368507 @default.
- W3203085507 hasConcept C113196181 @default.
- W3203085507 hasConcept C120665830 @default.
- W3203085507 hasConcept C121332964 @default.
- W3203085507 hasConcept C127313418 @default.
- W3203085507 hasConcept C151730666 @default.
- W3203085507 hasConcept C159985019 @default.
- W3203085507 hasConcept C162996421 @default.
- W3203085507 hasConcept C168834538 @default.
- W3203085507 hasConcept C171250308 @default.
- W3203085507 hasConcept C185592680 @default.
- W3203085507 hasConcept C19067145 @default.
- W3203085507 hasConcept C192562407 @default.
- W3203085507 hasConcept C22423302 @default.
- W3203085507 hasConcept C2777289219 @default.
- W3203085507 hasConcept C2779227376 @default.
- W3203085507 hasConcept C2780547777 @default.
- W3203085507 hasConcept C2816523 @default.
- W3203085507 hasConcept C43617362 @default.
- W3203085507 hasConcept C49040817 @default.
- W3203085507 hasConcept C50774322 @default.
- W3203085507 hasConcept C55148256 @default.
- W3203085507 hasConcept C61427134 @default.
- W3203085507 hasConcept C64297162 @default.
- W3203085507 hasConcept C71039073 @default.
- W3203085507 hasConcept C86803240 @default.
- W3203085507 hasConceptScore W3203085507C107365816 @default.
- W3203085507 hasConceptScore W3203085507C111368507 @default.
- W3203085507 hasConceptScore W3203085507C113196181 @default.
- W3203085507 hasConceptScore W3203085507C120665830 @default.
- W3203085507 hasConceptScore W3203085507C121332964 @default.
- W3203085507 hasConceptScore W3203085507C127313418 @default.
- W3203085507 hasConceptScore W3203085507C151730666 @default.
- W3203085507 hasConceptScore W3203085507C159985019 @default.
- W3203085507 hasConceptScore W3203085507C162996421 @default.
- W3203085507 hasConceptScore W3203085507C168834538 @default.
- W3203085507 hasConceptScore W3203085507C171250308 @default.
- W3203085507 hasConceptScore W3203085507C185592680 @default.
- W3203085507 hasConceptScore W3203085507C19067145 @default.
- W3203085507 hasConceptScore W3203085507C192562407 @default.
- W3203085507 hasConceptScore W3203085507C22423302 @default.
- W3203085507 hasConceptScore W3203085507C2777289219 @default.
- W3203085507 hasConceptScore W3203085507C2779227376 @default.
- W3203085507 hasConceptScore W3203085507C2780547777 @default.
- W3203085507 hasConceptScore W3203085507C2816523 @default.
- W3203085507 hasConceptScore W3203085507C43617362 @default.
- W3203085507 hasConceptScore W3203085507C49040817 @default.
- W3203085507 hasConceptScore W3203085507C50774322 @default.
- W3203085507 hasConceptScore W3203085507C55148256 @default.
- W3203085507 hasConceptScore W3203085507C61427134 @default.
- W3203085507 hasConceptScore W3203085507C64297162 @default.
- W3203085507 hasConceptScore W3203085507C71039073 @default.
- W3203085507 hasConceptScore W3203085507C86803240 @default.
- W3203085507 hasLocation W32030855071 @default.
- W3203085507 hasOpenAccess W3203085507 @default.
- W3203085507 hasPrimaryLocation W32030855071 @default.
- W3203085507 hasRelatedWork W1902697858 @default.
- W3203085507 hasRelatedWork W1995810423 @default.
- W3203085507 hasRelatedWork W2015401539 @default.
- W3203085507 hasRelatedWork W2023571262 @default.
- W3203085507 hasRelatedWork W2060434562 @default.
- W3203085507 hasRelatedWork W2077118741 @default.
- W3203085507 hasRelatedWork W2087642814 @default.
- W3203085507 hasRelatedWork W2109323357 @default.
- W3203085507 hasRelatedWork W2316948141 @default.
- W3203085507 hasRelatedWork W2373579184 @default.
- W3203085507 isParatext "false" @default.
- W3203085507 isRetracted "false" @default.
- W3203085507 magId "3203085507" @default.
- W3203085507 workType "article" @default.