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- W3204927390 abstract "Lithography technologies have courageously advanced down to smaller critical dimension (CD), which is a core technology for the fabrication of integrated circuits (IC) that form the backbone of the global communications and advanced computation capabilities that have transformed modern life over the last half-century. According to the Rayleigh criterion, the most intuitive way to shrink the CD size is to apply a new light source with shorter wavelength rather than use the existing ultraviolet (UV) light, that is, the light wavelength shorter than 193 nm or other lithographic techniques should be applied. This chapter starts with the basic working principle of optical lithography, the following section looks at the evolutionary history of this technology. From that point, the interrelation with IC manufacturing is described. At the end of this chapter, extreme ultraviolet (EUV) lithography, which is the next-generation lithography to enable the continued extension of Moore's law, is described." @default.
- W3204927390 created "2021-10-11" @default.
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- W3204927390 date "2021-09-01" @default.
- W3204927390 modified "2023-10-17" @default.
- W3204927390 title "Introduction to optical lithography" @default.
- W3204927390 doi "https://doi.org/10.1088/978-0-7503-2652-0ch1" @default.
- W3204927390 hasPublicationYear "2021" @default.
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