Matches in SemOpenAlex for { <https://semopenalex.org/work/W3205509578> ?p ?o ?g. }
Showing items 1 to 74 of
74
with 100 items per page.
- W3205509578 abstract "For the semiconductor and liquid crystal display manufacturing process, resist removal by using laser irradiation has been investigated instead of conventional processes such as oxygen plasma and chemical method. An advanced laser resist stripping method for the positive-tone diazonaphthoquinone (DNQ) / novolak resist was successfully developed without causing the laser damage to the Si wafer. The pulsed laser irradiation in water can improve the resist stripping effect when compared with that of conventional atmosphere irradiation, however, the mechanism has yet to be clarified. In this study, we investigated the analysis of resist stripping phenomenon by using a high-speed laser imaging system. A pulsed laser at 640 nm (pulse duration: 40 ns) was used as an illumination laser and a CCD camera detected the reflectance image on the sample. Time resolution of this system depended on the pulse duration of illumination laser. Time-resolved images were acquired based on the “1-on-1” method. Time-resolved images were acquired from 40 ns to 10 us after the laser irradiation. At the laser irradiated spot, changes of the resist were observed after 40 ns from the laser irradiation. The resist was completely stripped from the Si wafer surface after 10 us. The duration of resist removal phenomenon in the water condition was longer than that in the normal atmosphere condition. A resist stripping mechanism could be elucidated by combining experimental high-speed laser imaging and a finite element (FE) analysis. The mechanism of the resist stripping in the water condition will be presented." @default.
- W3205509578 created "2021-10-25" @default.
- W3205509578 creator A5005581859 @default.
- W3205509578 creator A5028685212 @default.
- W3205509578 creator A5034012065 @default.
- W3205509578 creator A5036749353 @default.
- W3205509578 creator A5042715287 @default.
- W3205509578 creator A5055618351 @default.
- W3205509578 creator A5059191794 @default.
- W3205509578 creator A5083105922 @default.
- W3205509578 date "2021-10-12" @default.
- W3205509578 modified "2023-09-23" @default.
- W3205509578 title "High-speed imaging of photoresist stripping phenomena induced by laser irradiation without causing the laser damage" @default.
- W3205509578 doi "https://doi.org/10.1117/12.2598555" @default.
- W3205509578 hasPublicationYear "2021" @default.
- W3205509578 type Work @default.
- W3205509578 sameAs 3205509578 @default.
- W3205509578 citedByCount "0" @default.
- W3205509578 crossrefType "proceedings-article" @default.
- W3205509578 hasAuthorship W3205509578A5005581859 @default.
- W3205509578 hasAuthorship W3205509578A5028685212 @default.
- W3205509578 hasAuthorship W3205509578A5034012065 @default.
- W3205509578 hasAuthorship W3205509578A5036749353 @default.
- W3205509578 hasAuthorship W3205509578A5042715287 @default.
- W3205509578 hasAuthorship W3205509578A5055618351 @default.
- W3205509578 hasAuthorship W3205509578A5059191794 @default.
- W3205509578 hasAuthorship W3205509578A5083105922 @default.
- W3205509578 hasConcept C111337013 @default.
- W3205509578 hasConcept C120665830 @default.
- W3205509578 hasConcept C121332964 @default.
- W3205509578 hasConcept C134406635 @default.
- W3205509578 hasConcept C159985019 @default.
- W3205509578 hasConcept C160671074 @default.
- W3205509578 hasConcept C169150495 @default.
- W3205509578 hasConcept C171250308 @default.
- W3205509578 hasConcept C185544564 @default.
- W3205509578 hasConcept C192562407 @default.
- W3205509578 hasConcept C2779227376 @default.
- W3205509578 hasConcept C41952129 @default.
- W3205509578 hasConcept C49040817 @default.
- W3205509578 hasConcept C520434653 @default.
- W3205509578 hasConcept C53524968 @default.
- W3205509578 hasConceptScore W3205509578C111337013 @default.
- W3205509578 hasConceptScore W3205509578C120665830 @default.
- W3205509578 hasConceptScore W3205509578C121332964 @default.
- W3205509578 hasConceptScore W3205509578C134406635 @default.
- W3205509578 hasConceptScore W3205509578C159985019 @default.
- W3205509578 hasConceptScore W3205509578C160671074 @default.
- W3205509578 hasConceptScore W3205509578C169150495 @default.
- W3205509578 hasConceptScore W3205509578C171250308 @default.
- W3205509578 hasConceptScore W3205509578C185544564 @default.
- W3205509578 hasConceptScore W3205509578C192562407 @default.
- W3205509578 hasConceptScore W3205509578C2779227376 @default.
- W3205509578 hasConceptScore W3205509578C41952129 @default.
- W3205509578 hasConceptScore W3205509578C49040817 @default.
- W3205509578 hasConceptScore W3205509578C520434653 @default.
- W3205509578 hasConceptScore W3205509578C53524968 @default.
- W3205509578 hasLocation W32055095781 @default.
- W3205509578 hasOpenAccess W3205509578 @default.
- W3205509578 hasPrimaryLocation W32055095781 @default.
- W3205509578 hasRelatedWork W1542185001 @default.
- W3205509578 hasRelatedWork W1983248817 @default.
- W3205509578 hasRelatedWork W1984894958 @default.
- W3205509578 hasRelatedWork W1986393757 @default.
- W3205509578 hasRelatedWork W2019409431 @default.
- W3205509578 hasRelatedWork W2032661179 @default.
- W3205509578 hasRelatedWork W2310309241 @default.
- W3205509578 hasRelatedWork W2334762199 @default.
- W3205509578 hasRelatedWork W2546835089 @default.
- W3205509578 hasRelatedWork W2636717976 @default.
- W3205509578 isParatext "false" @default.
- W3205509578 isRetracted "false" @default.
- W3205509578 magId "3205509578" @default.
- W3205509578 workType "article" @default.