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- W3213073443 abstract "Although primarily conceived as an imaging tool, light sheet technology has many dimensions. It is essential to realize that light-sheet technology is distinct from the existing technology which is heavily dependent on point-based illumination / interrogation. Of late, light sheet technology (LST) has been introduced for micro and nanolithography. Traditionally, lithography and nano-patterning are based on point/patterned exposure. LST offers sensitivity, control, and selectivity, enabling planeselective patterning within a volume substrate. We will discuss few light sheet lithography techniques that include spatial-filter-based lithography, multisheet lithography, and interference lithography (iCLASS). Fabrication of micro and nano-structures such as nanochannels, nanowaveguides, and nano-grating can be realized on a photosensitive photopolymer system. Moreover, it is expected that complex patterns can be fabricated in the near future. Overall, light sheet-based lithography has a bright future in the fabrication of nanostructures in demanding situations (requiring on-sight patterning) and remote locations (such as outer-space)." @default.
- W3213073443 created "2021-11-22" @default.
- W3213073443 creator A5042489127 @default.
- W3213073443 date "2021-10-21" @default.
- W3213073443 modified "2023-10-14" @default.
- W3213073443 title "Coherent and Incoherent Light Sheets for Micro/Nanolithography" @default.
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- W3213073443 doi "https://doi.org/10.1063/9780735423398_008" @default.
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