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- W3214492075 abstract "With the development of acid catalyzed resist coatings, there is a need to better understand the TAG synthetic chemistry as it relates to performance of the final formulation. Earlier studies have correlated chemical structure to the rate of thermal decomposition. However, very little work has been done in looking at the synthetic chemistry as it relates to resist coatings and functional performance. During this study, both iodonium salts and sulfonate esters were studied. We have looked at how the TAG residual acid level impacts the functional properties of photoresist coatings. The results show that residual acid levels can significantly affect photospeed, cross linking, and thermal properties but have little or no effect on resolution and focus latitude." @default.
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- W3214492075 date "2000-01-01" @default.
- W3214492075 modified "2023-09-26" @default.
- W3214492075 title "Thermal acid generator(TAG) synthesis variables and their effect on resist performance." @default.
- W3214492075 hasPublicationYear "2000" @default.
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