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- W3214550518 endingPage "3085" @default.
- W3214550518 startingPage "3085" @default.
- W3214550518 abstract "As one of the important technologies in the field of heterogeneous integration, transfer technology has broad application prospects and unique technical advantages. This transfer technology includes the wet chemical etching of a sacrificial layer, such that silicon nano-film devices are released from the donor substrate and can be transferred. However, in the process of wet etching the SiO2 sacrificial layer present underneath the single-crystal silicon nano-film by using the transfer technology, the etching is often incomplete, which seriously affects the efficiency and quality of the transfer and makes the device preparation impossible. This article analyzes the principle of incomplete etching, and compares the four factors that affect the etching process, including the size of Si nano-film on top of the sacrificial layer, the location of the anchor point, the shape of Si nano-film on top of the sacrificial layer, and the thickness of the sacrificial layer. Finally, the etching conditions are obtained to avoid the phenomenon of incomplete etching of the sacrificial layer, so that the transfer technology can be better applied in the field of heterogeneous integration. Additionally, Si MOSFETs (Metal-Oxide-Semiconductor Field Effect Transistors) on sapphire substrate were fabricated by using the optimized transfer technology." @default.
- W3214550518 created "2021-11-22" @default.
- W3214550518 creator A5020285133 @default.
- W3214550518 creator A5052123017 @default.
- W3214550518 creator A5056570655 @default.
- W3214550518 creator A5063135925 @default.
- W3214550518 creator A5074264859 @default.
- W3214550518 creator A5088594801 @default.
- W3214550518 date "2021-11-16" @default.
- W3214550518 modified "2023-10-14" @default.
- W3214550518 title "Optimization of Sacrificial Layer Etching in Single-Crystal Silicon Nano-Films Transfer Printing for Heterogeneous Integration Application" @default.
- W3214550518 cites W1968253090 @default.
- W3214550518 cites W1999479120 @default.
- W3214550518 cites W2017103211 @default.
- W3214550518 cites W2050645876 @default.
- W3214550518 cites W2062847796 @default.
- W3214550518 cites W2078782272 @default.
- W3214550518 cites W2110134128 @default.
- W3214550518 cites W2154293914 @default.
- W3214550518 cites W2175162897 @default.
- W3214550518 cites W2327927980 @default.
- W3214550518 cites W2396684843 @default.
- W3214550518 cites W2741026940 @default.
- W3214550518 cites W2791976614 @default.
- W3214550518 cites W2808368294 @default.
- W3214550518 cites W2903783517 @default.
- W3214550518 cites W2982474309 @default.
- W3214550518 cites W3036151719 @default.
- W3214550518 cites W4212842305 @default.
- W3214550518 doi "https://doi.org/10.3390/nano11113085" @default.
- W3214550518 hasPubMedCentralId "https://www.ncbi.nlm.nih.gov/pmc/articles/8622541" @default.
- W3214550518 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/34835848" @default.
- W3214550518 hasPublicationYear "2021" @default.
- W3214550518 type Work @default.
- W3214550518 sameAs 3214550518 @default.
- W3214550518 citedByCount "0" @default.
- W3214550518 crossrefType "journal-article" @default.
- W3214550518 hasAuthorship W3214550518A5020285133 @default.
- W3214550518 hasAuthorship W3214550518A5052123017 @default.
- W3214550518 hasAuthorship W3214550518A5056570655 @default.
- W3214550518 hasAuthorship W3214550518A5063135925 @default.
- W3214550518 hasAuthorship W3214550518A5074264859 @default.
- W3214550518 hasAuthorship W3214550518A5088594801 @default.
- W3214550518 hasBestOaLocation W32145505181 @default.
- W3214550518 hasConcept C100460472 @default.
- W3214550518 hasConcept C111368507 @default.
- W3214550518 hasConcept C127313418 @default.
- W3214550518 hasConcept C1291036 @default.
- W3214550518 hasConcept C130472188 @default.
- W3214550518 hasConcept C159985019 @default.
- W3214550518 hasConcept C171250308 @default.
- W3214550518 hasConcept C192562407 @default.
- W3214550518 hasConcept C2776226143 @default.
- W3214550518 hasConcept C2777289219 @default.
- W3214550518 hasConcept C2779227376 @default.
- W3214550518 hasConcept C2780357685 @default.
- W3214550518 hasConcept C33220542 @default.
- W3214550518 hasConcept C49040817 @default.
- W3214550518 hasConcept C544956773 @default.
- W3214550518 hasConceptScore W3214550518C100460472 @default.
- W3214550518 hasConceptScore W3214550518C111368507 @default.
- W3214550518 hasConceptScore W3214550518C127313418 @default.
- W3214550518 hasConceptScore W3214550518C1291036 @default.
- W3214550518 hasConceptScore W3214550518C130472188 @default.
- W3214550518 hasConceptScore W3214550518C159985019 @default.
- W3214550518 hasConceptScore W3214550518C171250308 @default.
- W3214550518 hasConceptScore W3214550518C192562407 @default.
- W3214550518 hasConceptScore W3214550518C2776226143 @default.
- W3214550518 hasConceptScore W3214550518C2777289219 @default.
- W3214550518 hasConceptScore W3214550518C2779227376 @default.
- W3214550518 hasConceptScore W3214550518C2780357685 @default.
- W3214550518 hasConceptScore W3214550518C33220542 @default.
- W3214550518 hasConceptScore W3214550518C49040817 @default.
- W3214550518 hasConceptScore W3214550518C544956773 @default.
- W3214550518 hasFunder F4320321001 @default.
- W3214550518 hasIssue "11" @default.
- W3214550518 hasLocation W32145505181 @default.
- W3214550518 hasLocation W32145505182 @default.
- W3214550518 hasLocation W32145505183 @default.
- W3214550518 hasLocation W32145505184 @default.
- W3214550518 hasOpenAccess W3214550518 @default.
- W3214550518 hasPrimaryLocation W32145505181 @default.
- W3214550518 hasRelatedWork W1968581245 @default.
- W3214550518 hasRelatedWork W2051282158 @default.
- W3214550518 hasRelatedWork W2085329596 @default.
- W3214550518 hasRelatedWork W2131076562 @default.
- W3214550518 hasRelatedWork W2371338989 @default.
- W3214550518 hasRelatedWork W2378038125 @default.
- W3214550518 hasRelatedWork W2546297835 @default.
- W3214550518 hasRelatedWork W3176589696 @default.
- W3214550518 hasRelatedWork W3214550518 @default.
- W3214550518 hasRelatedWork W4285092166 @default.
- W3214550518 hasVolume "11" @default.
- W3214550518 isParatext "false" @default.
- W3214550518 isRetracted "false" @default.
- W3214550518 magId "3214550518" @default.
- W3214550518 workType "article" @default.